Silicon Run Deposition uses 3D atomic animation and live manufacturing footage to provide a detailed close-up look at the process of thin film deposition in CMOS fabrication. It shows the chemical and physical reactions that create the dielectric and conductive layers of an integrated circuit. Silicon Run Deposition examines the selection of raw materials according to the process and equipment to be used and the material's ability to produce quality films with the desired properties. Also featured is the intricate role that temperature, time, pressure, and reactant concentrations all play at the atomic level.