Silicon Run I uses live industrial footage to show the many processes necessary to manufacture microchips, including crystal growth, circuit design, and the wafer fabrication process for CMOS technology. Using close-ups of manufacturing processes and device animation, Silicon Run I provides a clear overview of front-end semiconductor manufacturing. It is an ideal training tool for college students and industry professionals at all levels.
Silicon Run II explores manufacturing after the silicon wafers have been fabricated. This film reviews IC fabrication and continues by showing how IC wafers are tested, sorted, and packaged into individual microchips. These devices are then assembled onto the printed circuit boards used in personal computers. They are also seen assembled onto the multi-chip modules of high-end computers.
Silicon Run Lite combines key sequences and images from both Silicon Run I and Silicon Run II to show from the growth of silicon crystals through the assembly of a personal computer. Live industrial footage, microscopic filming, animation, graphics, and special effects give an up-close view of manufacturing. Silicon Run Lite is an ideal introduction to the semiconductor and electronics industry that everyone can enjoy. It is particularly suited to beginning electronics and pre-engineering students, general science courses, and senior high school physics or technology courses, as well as industry's new employees and non-technical personnel.
Silicon Run Lithography examines the role of photolithography in imaging and printing the many intricate layers of integrated circuits. Focusing on critical and non-critical mask levels of a CMOS transistor, this video takes a close look at the manufacturing materials, tools, and processes that have made more precise and complex submicron lithography possible. Silicon Run Lithography shows how mask patterns are greatly reduced and precisely positioned on silicon wafers using "step and repeat" and "step and scan" exposure processes.
Silicon Run Deposition uses 3D atomic animation and live manufacturing footage to provide a detailed close-up look at the process of thin film deposition in CMOS fabrication. It shows the chemical and physical reactions that create the dielectric and conductive layers of an integrated circuit. Silicon Run Deposition examines the selection of raw materials according to the process and equipment to be used and the material's ability to produce quality films with the desired properties. Also featured is the intricate role that temperature, time, pressure, and reactant concentrations all play at the atomic level.
This sixth video in the Silicon Run Series takes a close look at the etch process in semiconductor manufacturing, including chemical mechanical polish, or CMP. It shows how thin films of nonconductive, semiconductive, and conductive materials are sculpted into microchips. Following the fabrication process of a CMOS transistor, Silicon Run Etch looks specifically at dielectric etch, silicon etch, and metal etch. It also explores the role of pressure, gas flows, RF power, temperature, and machine geometry within the plasma etch processes.
Silicon Run Implantation takes a close look at the process of ion implantation. This video shows how ions are accelerated to high energies and directed into specific regions of the silicon substrate to change its molecular structure and alter its electrical properties. Silicon Run Implantation explores the various types of ion implanters used in IC fabrication. It also shows the role of energy, electrical potentials, beam analysis, ion acceleration, wafer scanning, and tilting in different ion implanters.